论文

Towards？High-Performance？Top-Gate？Ultrathin？HfS2？Field-Effect Transistors by Interface Engineering

论文编号:

作者:

Kai Xu

刊物名称:

Small

所属学科:

论文题目英文:

Towards？High-Performance？Top-Gate？Ultrathin？HfS2？Field-Effect Transistors by Interface Engineering

年:

2016

卷:

期:

页:

3102-3111

联系作者:

Li, Dongguo；Han, Dong

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影响因子:

参与作者:

备注: